Advanced Nanoscale ULSI Interconnects Fundamentals and Applications

This book PDF is perfect for those who love Science genre, written by Yosi Shacham-Diamand and published by Springer Science & Business Media which was released on 19 September 2009 with total hardcover pages 552. You could read this book directly on your devices with pdf, epub and kindle format, check detail and related Advanced Nanoscale ULSI Interconnects Fundamentals and Applications books below.

Advanced Nanoscale ULSI Interconnects  Fundamentals and Applications
Author : Yosi Shacham-Diamand
File Size : 46,7 Mb
Publisher : Springer Science & Business Media
Language : English
Release Date : 19 September 2009
ISBN : 9780387958682
Pages : 552 pages
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Advanced Nanoscale ULSI Interconnects Fundamentals and Applications by Yosi Shacham-Diamand Book PDF Summary

In Advanced ULSI interconnects – fundamentals and applications we bring a comprehensive description of copper-based interconnect technology for ultra-lar- scale integration (ULSI) technology for integrated circuit (IC) application. In- grated circuit technology is the base for all modern electronics systems. You can ?nd electronics systems today everywhere: from toys and home appliances to a- planes and space shuttles. Electronics systems form the hardware that together with software are the bases of the modern information society. The rapid growth and vast exploitation of modern electronics system create a strong demand for new and improved electronic circuits as demonstrated by the amazing progress in the ?eld of ULSI technology. This progress is well described by the famous “Moore’s law” which states, in its most general form, that all the metrics that describe integrated circuit performance (e. g. , speed, number of devices, chip area) improve expon- tially as a function of time. For example, the number of components per chip d- bles every 18 months and the critical dimension on a chip has shrunk by 50% every 2 years on average in the last 30 years. This rapid growth in integrated circuits te- nology results in highly complex integrated circuits with an increasing number of interconnects on chips and between the chip and its package. The complexity of the interconnect network on chips involves an increasing number of metal lines per interconnect level, more interconnect levels, and at the same time a reduction in the interconnect line critical dimensions.

Advanced Nanoscale ULSI Interconnects  Fundamentals and Applications

In Advanced ULSI interconnects – fundamentals and applications we bring a comprehensive description of copper-based interconnect technology for ultra-lar- scale integration (ULSI) technology for integrated circuit (IC) application. In- grated circuit technology is the base for all modern electronics systems. You can ?nd electronics systems today everywhere: from toys and home

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