Materials and Processes for Next Generation Lithography

This book PDF is perfect for those who love Technology & Engineering genre, written by Anonim and published by Elsevier which was released on 08 November 2016 with total hardcover pages 634. You could read this book directly on your devices with pdf, epub and kindle format, check detail and related Materials and Processes for Next Generation Lithography books below.

Materials and Processes for Next Generation Lithography
Author : Anonim
File Size : 47,8 Mb
Publisher : Elsevier
Language : English
Release Date : 08 November 2016
ISBN : 9780081003589
Pages : 634 pages
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Materials and Processes for Next Generation Lithography by Anonim Book PDF Summary

As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. Assembles up-to-date information from the world’s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation Includes information on processing and metrology techniques Brings together multiple approaches to litho pattern recording from academia and industry in one place

Materials and Processes for Next Generation Lithography

As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography

Get Book
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