Plasma Etching Processes for CMOS Devices Realization

This book PDF is perfect for those who love Technology & Engineering genre, written by Nicolas Posseme and published by Elsevier which was released on 25 January 2017 with total hardcover pages 136. You could read this book directly on your devices with pdf, epub and kindle format, check detail and related Plasma Etching Processes for CMOS Devices Realization books below.

Plasma Etching Processes for CMOS Devices Realization
Plasma Etching Processes for CMOS Devices Realization
Author : Nicolas Posseme
File Size : 52,6 Mb
Publisher : Elsevier
Language : English
Release Date : 25 January 2017
ISBN : 9780081011966
Pages : 136 pages
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Plasma Etching Processes for CMOS Devices Realization by Nicolas Posseme Book PDF Summary

Plasma etching has long enabled the perpetuation of Moore's Law. Today, etch compensation helps to create devices that are smaller than 20 nm. But, with the constant downscaling in device dimensions and the emergence of complex 3D structures (like FinFet, Nanowire and stacked nanowire at longer term) and sub 20 nm devices, plasma etching requirements have become more and more stringent. Now more than ever, plasma etch technology is used to push the limits of semiconductor device fabrication into the nanoelectronics age. This will require improvement in plasma technology (plasma sources, chamber design, etc.), new chemistries (etch gases, flows, interactions with substrates, etc.) as well as a compatibility with new patterning techniques such as multiple patterning, EUV lithography, Direct Self Assembly, ebeam lithography or nanoimprint lithography. This book presents these etch challenges and associated solutions encountered throughout the years for transistor realization. Helps readers discover the master technology used to pattern complex structures involving various materials Explores the capabilities of cold plasmas to generate well controlled etched profiles and high etch selectivities between materials Teaches users how etch compensation helps to create devices that are smaller than 20 nm

Plasma Etching Processes for CMOS Devices Realization

Plasma Etching Processes for CMOS Devices Realization by Nicolas Posseme

Plasma etching has long enabled the perpetuation of Moore's Law. Today, etch compensation helps to create devices that are smaller than 20 nm. But, with the constant downscaling in device dimensions and the emergence of complex 3D structures (like FinFet, Nanowire and stacked nanowire at longer term) and sub 20 nm devices,

Get Book
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