Author | : G. Mathad |
File Size | : 41,7 Mb |
Publisher | : The Electrochemical Society |
Language | : English |
Release Date | : 01 November 2008 |
ISBN | : 9781566776653 |
Pages | : 89 pages |
Plasma Processing 17 by G. Mathad Book PDF Summary
This issue of ECS Transactions contains papers presented at the International Symposium on Plasma Processing. The symposium, 17th in the series, cosponsored by the Dielectric Science & Technology, Electronics, and Photonics Divisions was held as part of the 213th Meeting of The Electrochemical Society, Inc., in Phoenix, AZ, USA, May 18 - 23, 2008. A total of 14 papers were presented from Belgium, Germany, Italy, Japan, Republic of Korea, Russia, and the USA on topics mainly focused on diagnostics & measurements and etching & deposition processes.