Development and Application of In Situ Real Time and Ex Situ Characterization Techniques to Study the Growth of High Temperature Superconducting HTSC Films and Interfaces

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Development and Application of In Situ Real Time and Ex Situ Characterization Techniques to Study the Growth of High Temperature Superconducting HTSC Films and Interfaces

Author	: Anonim
File Size	: 55,6 Mb
Publisher	: Unknown
Language	: English
Release Date	: 27 April 1997
ISBN	: OCLC:946109367
Pages	: 0 pages

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Development and Application of In Situ Real Time and Ex Situ Characterization Techniques to Study the Growth of High Temperature Superconducting HTSC Films and Interfaces by Anonim Book PDF Summary

The objectives of this program are: (1) To demonstrate Time of Flight Ion Scattering and Recoil (ToF-ISARS) Spectroscopy and Spectroscopic Ellipsometry (SE) for in-situ and real time characterization of HTSC thin films and processes. (2) To study HTSC thin film processes and interface reactions.

Development and Application of In Situ Real Time and Ex Situ Characterization Techniques to Study the Growth of High Temperature Superconducting HTSC Films and Interfaces by Anonim

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